Customer Quotes

Calibre DRC/LVS and Calibre xRC

AMI Semiconductor

"The thing that pushed us to Calibre was the speed. Some of the engineers here had developed a new quick design flow in a compact process. We were struggling with Assura (running 20+ hours). Without major tweaking, Calibre was able to run in less then 5 hours."
Jake Wright
Source - DeepChip
 

Atmel

Atmel increases yield while reducing time-to-market and design costs with Mentor Graphics Calibre® nmDRC, LVS and xRC
Source - Customer Success Story
 

GSMC

"Calibre's extensive rule file coverage, design-style independence and on-time customer support made it the best choice for the complex designs our customers are creating. Selecting Calibre ensures customers a confident design transfer and a smooth manufacturing process."
Stephen Kuo
Design Service Department Manager, Technology Development Unit
 

Guidant Corp

"One thing I like about Calibre DRC is that I have ability to verify and record all Design Rule Waivers. I can reload this waived file during iteration of refining and tweaking design at last stage, the waived errors are all marked already. It saves huge time when I have over a thousand markers in a design deviating from the foundry Design Rule."
Michelle Lee
Source - DeepChip
 

Hua Hong NEC

"The Calibre tool is production-proven and offers a single, robust platform from design to silicon. The fact that the Calibre tool is an industry standard worldwide was also a major factor in its selection as our internal standard."
Yao Zeqiang, Ph.D.
Deputy Director, Product Engineering Department
 

IBM

"The new Calibre and xCalibre rule files enable joint customers of IBM and Mentor to more rapidly and accurately perform physical verification and parasitic extraction. Mentor has done a phenomenal job of providing sufficient capacity for modern mixed-signal designs and integrating the physical verification debug process with IC layout and schematic capture."
Carl Dickey
Mixed-Signal Strategist, IBM Microelectronics SiGe BiCMOS Foundry
 

Jazz Semiconductor

"Our long history and successful track record with Calibre/xCalibre were key factors in our selection process. Calibre and xCalibres excellent mixed-signal/RF capabilities, including advanced device recognition, extraction accuracy, and tight design environment integration, will provide us with the tools we need to offer a best-in-class production-proven environment for our customers advanced semiconductor designs."
Marco Racanelli
Executive Director of Research and Development
 

Motorola

"Calibres robust extraction syntax and circuit compare capabilities allow it to properly check even the most difficult analog circuitry without impacting full-chip performance."
Rodney Jacks
Senior CAD Engineer
 

NEC

"Calibre offers a unique combination of performance, accuracy, and capability allowing us to implement an optimal recipe for our 0.095 micron process. Calibre is already in use with our 0.180 and 0.150 micron technologies, and NEC is aggressively moving forward with advanced semiconductor processes. Calibre is a key enabler in accelerating this schedule."
Dr. Kazuhiko Takamizawa
Senior Manager of System LSI Design Engineering Division
 

Oki Semiconductor

"Without Calibre, we were unable to properly verify designs with more than a million gates. Calibre offers speed, capacity and ease of use with our advanced technologies. It also allows us to compete more effectively with other leading manufacturers in this market segment."
Jamshed Qamar
Vice president, ASIC Business Development
 

Silterra

"Selecting Calibre as the standard for our verification tool platform ensures that our customers designs are flawless and the ensuing manufacturing process is smooth. Calibres extensive rule file coverage and advanced resolution enhancement technologies make it the best technology choice for our customers and partners."
Victor Kwong
Vice President of Design Solutions
 

SMIC

"Calibres extensive rule file coverage is production-proven, ensuring that our customers and design partners gain a smooth transition to manufacture. Advanced device recognition capabilities and design-style independence make Calibre one of the best choices for the complex designs our customers are developing."
Dr. James Sung
Vice President of Marketing and Sales
 

STMicroelectronics

"We now use the same comprehensive Calibre rule files for cell/block verification as we do for full-chip verification. This gives us the confidence that the design will be successful through tapeout with the least amount of iteration necessary. After many successful silicon runs at .12 micron using Calibre OPC tools, we have standardized on it for our high-volume, production-level .10 micron processes."
D. Goubier
Reticle Assembly Team Manager, Central R&D
 

Stretch, Inc.

"Calibre LVS and DRC is still the industry leader for cell level to full-chip backend verification. Calibre xRC is essential for the design process as it can provide parasitic data in various formats that can used by simulation tools (ie., spice, DSPF, SPEF). The availability to run on 64-bit linux multi-processor machines allows for reasonable full-chip debug."
Steven Chin
Source - DeepChip
 

Sun Microsystems

"Calibre is unfettered by any restrictive proprietary format or framework, which made it a perfect fit in our overall CAD strategy. And its multi-threading capability really made this tool fly on 12 CPU machines in our compute farm."
Ward Verycrusse
Senior CAD Architect
 

Texas Instruments

"Combining Mentor Graphics Calibre rules to TIs design tool capabilities will give our customers the ability to perform comprehensive physical verification of ASIC and mixed-signal system-on-a-chip (SoC) designs. We are excited to use Calibre to help enable widespread use of TIs silicon technology with our leading customers."
Bill Giolma
Worldwide Customer-Owned Tooling Manager
 

Tower Semiconductor

"We chose Calibre because it offers a single design-to-silicon platform that meets our requirements for performance, capacity and accuracy. Using Calibre not only streamlines our internal processes, thereby improving time to market, but also ensures that our customers receive fully qualified and extensive rule file support, which gives them a distinct market advantage."
Sergio Kusevitzky
Vice President of IP and Design Services
 

TSMC

"Design engineers can rely on high-quality Calibre rule files to verify their designs for TSMC silicon. Not only do we put them through TSMCs rigorous double-blind QA procedure, but, because Calibre has been used to verify designs in our production environment for the last 2.5 years, we know that they cover real-world design conditions."
Genda Hu
Vice President of Marketing
 

UMC

"At the 90nm technology generation, it becomes increasingly important for our customers to seamlessly move from design to successful silicon due to the complexity of modern SOC designs. Calibre rule files, production-proven for five years at UMC, receive extensive qualification to smooth the transition from tape-out to manufacture, thus reducing cost and time-to-profit for our customers."
Ken Liou
Division Director, Design Support Division
 

Vitesse Semiconductor

"After using all three of the major hierarchial tools, you'd have to work really hard to make me give up Calibre. The biggest reason is that its debugging capability is so far ahead of all the other tools out there."
Ron Talaga
Source - DeepChip
 

X-FAB

"X-FAB will offer its customers complete Mentor EDA support for the newly developed X-FAB master kits. These mixed-signal design kits support the complete Mentor verification product line with Calibre DRC™ and Calibre LVS™ for physical verification and xCalibre® for parasitic extraction, as well as the newest simulation tools based on the Mentor Graphics IC Flow and Design Architect®-IC, including ADVance MS™, Eldo™ and Modelsim®."
Thomas Ramsch
Manager Design Support, X-FAB Group
 

Calibre RET/MDP

DuPont Photomasks

"Retaining mask data hierarchy as long as possible has proven to be the best way to reduce cycle times and costs while also allowing us a more efficient operation of our current production equipment. Using Calibre MDP tools has shown that we can streamline our data flow even as we shift toward the challenges of the most advanced semiconductor designs."
Craig Kokjohn
Executive Vice President of Worldwide Operations
 

DuPont Photomasks

"DuPont Photomasks is committed to working on unique approaches that help our customers reduce cycle times and costs. Retaining mask data hierarchy as long as possible is one way of doing that as it provides for more efficient operation of our software and production equipment. Our joint development work with Mentor Graphics on these new Calibre products has produced very encouraging results, as these tools are expected to help streamline our data flow to accommodate the needs of the most advanced semiconductor designs."
Paul Chipman
Executive Vice President Development Products Group
 

Fujitsu

"The combination of the accurate model-based OPC and fast table-driven OPC proved to be a very successful and flexible solution for us. The full hierarchical solution enabled by Calibre streamlines our process flow greatly while satisfying the highest accuracy requirements."
Kiyoshi Watanabe
Director, Process Development Department
 

Hitachi

"We consider Calibre PSMgate the most reliable phase shift mask design solution. It not only enables phase assignment, it also works seamlessly with OPC and the model-based solutions. In order to implement our phase assignment scheme in a very flexible way, Calibre PSMgate, along with the other Calibre tools, is tightly integrated with our standard design flow, SOCplanner."
Yoshio Okamura
Department Manager, Design Technology Development Division, Semiconductor and Integrated Circuits Hitachi, Ltd.
 

IMEC

"Resolution enhancement techniques are critical for subwavelength manufacturing, and we are glad to formalize a relationship that has already proven to be fruitful in our research. Because Calibre makes use of all four resolution enhancement technologies, namely optical & process correction, phase-shift mask, scattering bars and off-axis illumination, including the very promising double-exposure dipole decomposition technique for the 70-nm node, our researchers have the tools they need to realize major breakthroughs. This is an important asset for the further developments within our 193-nm and 157-nm optical lithography IIAPs."
Dr. Luc Van den hove
Vice Pesident, Slicon Pocess Technology Division
 
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