Mask Synthesis (RET & Mask Preparation)


The Calibre MDP product line completes the integrated flow from IC design to IC mask manufacturing. The new tool suite allows for seamless continuation of the data manipulations required for resolution enhancement techniques (RET), such as phase shift mask (PSM), scattering bars (SB) and optical and process correction (OPC) to the mask data format conversion in one batch run. Calibre’s unique hierarchical geometry processing includes functions like layer derivation, mirroring, scaling, rotation, planarization fill, global and selective sizing.  The flow concludes with the output of the most important mask writer formats for advanced mask-making in the subwavelength era, such as MEBES and Variable-Shaped-Beam (VSB) formats as well as GDSII.

Hierarchical mask rule checking (MRC) is supported as well as mask proximity correction (MPC). Easy to handle viewing tools allow for fast assessment of problem areas.


 

Our third generation OPC tool that expands the Calibre arsenal of resolution enhancement technology (RET) products for sub-65 nanometer (nm) process technologies.

  • Calibre nmOPC
  • Calibre OPCverify

    Using silicon-proven simulation models, OPCverify provides 100% simulation coverage of the entire chip to ensure silicon-patterning success.

  • Calibre LFD: Litho-Friendly Design

    Captures manufacturing process variability in the design flow for "LFD clean" sign-off

  • Calibre RET (OPC and PSM)

    The Calibre product line's sub-wavelength resolution enhancement tools are the first complete physical verification and manufacturability solution.

  • Calibre MDP

    Calibre MDP tool suite allows for seamless continuation of the data manipulations required for resolution enhancement techniques (RET), such as phase shift mask (PSM), scattering bars (SB) and optical and process correction (OPC) to the mask data format conversion in one batch run.

  • Calibre nmDRC

    The industry standard for design rule checking.

SST On the Scene at SPIE 2007: DFM

Mentor Technology Viewpoint: RET/OPC

Mentor Technology Viewpoint: MDP
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